Vishay Selects AIXTRON SiC Multiwafer Batch Technology for Enhanced Semiconductor Production

AIXTRON SE, a provider of deposition equipment to the semiconductor industry, announced that Vishay Intertechnology, Inc. has chosen its G10-SiC epitaxy production system for Vishay's in-house needs in SiC epitaxy for power device manufacturing. With facilities at Vishay’s automotive-certified Newport fab in South Wales, the G10-SiC platform boasts a flexible wafer size configuration and supports high levels of productivity and uniformity in wafer production.

Vishay Intertechnology, recognized as one of the largest manufacturers of discrete semiconductors and passive electronic components, will use the G10-SiC system introduced by AIXTRON in September 2022. This technology allows for optimal uniformity and throughput in the production of SiC power devices, essential for various electronic components across multiple industries. The system ensures efficient control over doping levels and maintains superior performance across various wafer sizes, ideal for high-volume manufacturing environments.