BRIEF published on 04/11/2024 at 15:05, 11 months 20 days ago United States Patent Granted to Digitho Technologies Inc. for Groundbreaking Photomask Technology Innovation Technology Patent Photolithography Semiconductor
PRESS RELEASE published on 04/11/2024 at 15:00, 11 months 20 days ago United States Patent Granted to Digitho Technologies Inc. for Groundbreaking Photomask Technology Digitho Technologies Inc. receives its inaugural U.S. patent for a programmable photomask technology, revolutionizing photolithography in semiconductor microfabrication Innovation Photolithography Digitho Technologies Inc. Photomask Technology Semiconductor Microfabrication
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